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Volumn 47, Issue 9 PART 1, 2008, Pages 7295-7297
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Electrical and optical properties of amorphous and crystalline nondoped WO3-x films prepared by reactive RF sputtering
a
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Author keywords
Sputtering; Thin film; Tungsten trioxide; Variable range hopping
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Indexed keywords
ABSORPTION;
ABSORPTION SPECTROSCOPY;
ANNEALING;
CRYSTALLINE MATERIALS;
HEAT CONDUCTION;
OPTICAL MATERIALS;
OPTICAL PROPERTIES;
THICK FILMS;
THREE DIMENSIONAL;
TUNGSTEN;
MAGNETRON SPUTTERING;
THIN FILM DEVICES;
THIN FILMS;
DEGREE OF ABSORPTIONS;
ELECTRICAL AND OPTICAL PROPERTIES;
ELECTRON CONDUCTIONS;
HEXAGONAL STRUCTURES;
IN VACUUMS;
NO ABSORPTIONS;
NON DOPED;
RANGE HOPPING;
RF MAGNETRON SPUTTERING;
RF-SPUTTERING;
TUNGSTEN TRIOXIDE;
VARIABLE-RANGE HOPPING;
NON-DOPED;
R F SPUTTERING;
RF- MAGNETRON SPUTTERING;
SEMICONDUCTIVE;
VARIABLE-RANGE HOPPING CONDUCTIONS;
MAGNETRON SPUTTERING;
ABSORPTION SPECTROSCOPY;
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EID: 55149095927
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.47.7295 Document Type: Article |
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Times cited : (6)
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References (12)
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