Influence of annealing temperature on the formation and characteristics of sol-gel prepared ZnO films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1811-1816

  Castanedo Perez, R ^a   Jimenez Sandoval, O ^a   Jimenez Sandoval, S ^a   Marquez Marin J ^a   Mendoza Galvan A ^a   Torres Delgado, G ^a   Maldonado Alvarez, A ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION EDGES; ANNEALING TEMPERATURES; ELLIPSOMETRY MEASUREMENTS; FOURIER TRANSFORM INFRARED; FTIR; GRAIN SIZE; ORGANIC GROUP; POLYCRYSTALLINE; REFERENCE TEMPERATURE; SILICON WAFER SUBSTRATES; SODA LIME GLASS; SOL-GEL METHODS; UV-VIS SPECTRA; VOID-FREE; ZNO; ZNO FILMS; ZNO THIN FILM;

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DIFFRACTION; ELLIPSOMETRY; FOURIER TRANSFORMS; GELS; METALLIC FILMS; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOL-GEL PROCESS; SOL-GELS; SOLS; X RAY DIFFRACTION;

ZINC OXIDE;

EID: 55049127992     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581895     Document Type: Conference Paper

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