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Volumn 47, Issue 6 PART 2, 2008, Pages 5139-5141

Fabrication of defect-free nanoimprinted photonic crystals for laser applications

(9) Reboud, V a Kehagias, N a Lovera, P a Zelsmann, M b Schuster, C c Reuther, F c Gruetzner, G c Redmond, G a Sotomayor Torres, C M a,d,e

a UNIVERSITY COLLEGE CORK (Ireland)

b CEA LETI (France)

c MICRO RESIST TECHNOLOGY GMBH (Germany)

d CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2 (Spain)

e INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA (Spain)

Author keywords

Band edge laser; Nanoimprint lithography; Photonic crystal

Indexed keywords

ABS RESINS; CHROMOPHORES; CRYSTAL ATOMIC STRUCTURE; CRYSTALLOGRAPHY; CRYSTALS; FABRICATION; LASER APPLICATIONS; LASERS; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURED MATERIALS; OPTICALLY PUMPED LASERS; PHOTONICS; POLYMERS; POWDERS; PUMPING (LASER); SILICON ON INSULATOR TECHNOLOGY; TWO DIMENSIONAL;

BAND EDGE LASER; BAND EDGES; LASING FREQUENCIES; POLYMER PHOTONIC CRYSTALS; TRANSPARENT SUBSTRATES; WAVE ALGORITHMS;

PHOTONIC CRYSTALS;

EID: 55049111848 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.5139 Document Type: Article

Times cited : (4)

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