New oriented-molecular-beam machine for surface stereochemistry with X-ray photoemission spectroscopy

Japanese Journal of Applied Physics

Volumn 47, Issue 5 PART 1, 2008, Pages 3686-3691

  Okada, Michio ^a,b   Hashinokuchi, Michihiro ^a   Moritani, Kousuke ^c   Kasai, Toshio ^a   Teraoka, Yuden ^c  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Dissociative adsorption; Nitric oxide; Oriented molecular beam; Silicon; Steric effect; X ray photoemission spectroscopy

Indexed keywords

ADSORPTION; CHEMICAL MODIFICATION; CHEMICAL REACTIONS; DISSOCIATION; EMISSION SPECTROSCOPY; GRAFTING (CHEMICAL); LUMINESCENCE OF ORGANIC SOLIDS; MOLECULAR BEAMS; MOLECULAR DYNAMICS; NITRIC OXIDE; PHOTOELECTRICITY; PHOTOEMISSION; SILICON; STEREOCHEMISTRY; SYNTHESIS (CHEMICAL); X RAY APPARATUS;

DISSOCIATIVE ADSORPTION; DISSOCIATIVE ADSORPTIONS; ELECTROSTATIC FIELDS; HEXAPOLE; INCIDENT ENERGIES; ORIENTED MOLECULAR BEAM; PHOTOEMISSION SPECTROSCOPIES; POTENTIAL TOOLS; QUANTUM STATES; REACTION PRODUCTS; STEREOCHEMICAL CONTROLS; STERIC EFFECT; STERIC EFFECTS; SURFACE CHEMICAL REACTIONS; SURFACE MODIFICATIONS; X-RAY PHOTOEMISSION SPECTROSCOPY;

SURFACE REACTIONS;

EID: 55049104645     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.3686     Document Type: Article

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