Dependence of grain sizes and microstrains on annealing temperature in Fe/Pt multilayers and L10 FePt thin films

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 531-537

  Zotov, Nikolay ^a   Feydt, Jürgen ^b   Ludwig, Alfred ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b CENTER OF ADVANCED EUROPEAN STUDIES AND RESEARCH CAESAR   (Germany)

Author keywords

Annealing; FePt; Grain growth; Multilayers; Thin films; X ray diffraction

Indexed keywords

ACTIVATION ENERGY; ANNEALING; DIFFRACTION; FILM PREPARATION; GRAIN (AGRICULTURAL PRODUCT); GRAIN SIZE AND SHAPE; IRON COMPOUNDS; MAGNETIC THIN FILMS; MAGNETRON SPUTTERING; MULTILAYERS; PLATINUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SOLIDS; THICK FILMS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ANISOTROPIC; ANNEALING TEMPERATURES; AVERAGE GRAIN SIZES; EX-SITU; FAST GROWTHS; FE/PT MULTILAYERS; FEPT; GRAIN GROWTH EXPONENTS; GRAIN GROWTH MODELS; GRAIN SIZES; IN VACUUMS; MAGNETIC; MICROSTRAINS; ORDER PARAMETERS; OXIDIZED SI WAFERS; POLYCRYSTALLINE; SLOW GROWTH RATES; STACKING FAULT DENSITIES; X-RAY DIFFRACTIONS;

GRAIN GROWTH;

EID: 55049103853     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.062     Document Type: Article

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