Interaction of oxygen vacancies with domain walls and its impact on fatigue in ferroelectric thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5387, Issue , 2004, Pages 354-365

  Xiao, Yu ^a   Bhattacharya, Kaushik ^a  

^a California Institute of Technology   (United States)

Author keywords

Domain wall; Fatigue; Ferroelectric thin film; Oxygen vacancy; Wide band gap semiconductor

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC SPACE CHARGE; FATIGUE OF MATERIALS; OXYGEN; SEMICONDUCTOR MATERIALS; STRUCTURE (COMPOSITION);

DOMAIN WALL; ELASTIC DISPLACEMENT; OXYGEN VACANCY; WIDE BAND-GAP SEMICONDUCTORS;

FERROELECTRIC THIN FILMS;

EID: 5444262118     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.539588     Document Type: Conference Paper

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