Self-assembling formation of Ni nanodots on SiO2 induced by remote H2 plasma treatment and their electrical charging characteristics

Japanese Journal of Applied Physics

Volumn 47, Issue 4 PART 2, 2008, Pages 3099-3102

  Makihara, Katsunori ^a   Shimanoe, Kazuhiro ^a   Ikeda, Mitsuhisa ^a   Higashi, Seiichiro ^a   Miyazaki, Seiichi ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

AFM KFM; Nickel nanodots; Nickel silicide nanodots; Remote hydrogen plasma

Indexed keywords

ELECTRIC CHARGE; ELECTRON AFFINITY; ELECTRON INJECTION; HYDROGEN; NANOSTRUCTURED MATERIALS; NICKEL; NICKEL ALLOYS; PLASMA APPLICATIONS; PLASMAS; SEMICONDUCTOR QUANTUM DOTS; SILICIDES; SILICON; SILICON COMPOUNDS; SURFACE DIFFUSION;

ADJUSTING; AFM/KFM; AREAL DENSITIES; ELECTRICAL CHARGING; ENERGY REDUCTIONS; EXTERNAL-; HYDROGEN RADICALS; INDUCTIVE COUPLINGS; NI NANODOTS; NICKEL NANODOTS; NICKEL SILICIDE NANODOTS; PLASMA CONDITIONS; PLASMA TREATMENTS; REMOTE HYDROGEN PLASMA; ROOM TEMPERATURES; TIP BIASSED;

PLASMA DIAGNOSTICS;

EID: 54249148079     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.3099     Document Type: Article

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