Low-pressure alcohol chemical vapor deposition of single-wall carbon nanotubes with in situ catalyst deposition

Japanese Journal of Applied Physics

Volumn 47, Issue 4 PART 1, 2008, Pages 1978-1981

  Shiokawa, Takao ^a,c   Yoshida, Hiroshi ^a,b   Asakura, Masahiro ^a,b   Ihibashi, Koji ^a,c  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Alcohol catalytic chemical vapor deposition; In situ catalyst deposition; In situ growth; Low gas pressure; Single wall carbon nanotube; Ultrahigh vacuum

Indexed keywords

ARGON; CARBON; CARBON NANOTUBES; CATALYSIS; DEPOSITION; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTUBES; ORGANIC POLYMERS; SINGLE-WALLED CARBON NANOTUBES (SWCN); VACUUM; VACUUM DEPOSITION; VAPORS;

ALCOHOL CATALYTIC CHEMICAL VAPOR DEPOSITION; IN SITU CATALYST DEPOSITION; IN SITU GROWTH; LOW GAS PRESSURE; SINGLE-WALL CARBON NANOTUBE;

CHEMICAL VAPOR DEPOSITION;

EID: 54249121303     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.1978     Document Type: Article

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