Sulphide GaxGe25-xSb10S 65(x=0,5) sputtered films: Fabrication and optical characterizations of planar and rib optical waveguides

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Charrier, J ^a   Anne, M L ^b   Lhermite, H ^b   Nazabal, V ^b   Guin, J P ^b   Charpentier, F ^b   Jouan, T ^b   Henrio, F ^a   Bosc, D ^a   Adam, J L ^b  

^a UNIVERSITÉ DE RENNES 1   (France)

^b UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; AMORPHOUS FILMS; ANNEALING; DRY ETCHING; ELECTRIC LOSSES; ETCHING; FABRICATION; GERMANIUM; INTEGRATED OPTOELECTRONICS; MAGNETRON SPUTTERING; OPTICAL INSTRUMENTS; OPTICAL INTERCONNECTS; OPTICAL MICROSCOPY; OPTICAL WAVEGUIDES; PHOTORESISTS; PLASMA ETCHING; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SURFACE ROUGHNESS; WAVEGUIDES;

1550 NM; ATOMIC FORCES; DEPOSITION METHODS; ETCH DEPTHS; ETCHING PROCESSES; ETCHING RATES; GUIDED MODES; HIGH QUALITIES; INTERFACE ROUGHNESSES; OPTICAL; OPTICAL CHARACTERIZATIONS; OPTICAL INTERCONNECTIONS; OPTICAL NEAR FIELDS; OPTICAL TRANSMISSIONS; PROPAGATION LOSSES; REACTIVE IONS; RIB WAVEGUIDES; SI WAFERS; SIDE-WALLS; SILICON-ON-INSULATOR; SLAB WAVEGUIDES; SPUTTERED FILMS;

OPTICAL FILMS;

EID: 54049155096     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2968248     Document Type: Article

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