Evaluation of X-ray reflectivity of a MEMS X-ray optic

2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

Volumn , Issue , 2008, Pages 104-105

  Mitsuishi, I ^a   Ezoe, Y ^b   Koshiishi, M ^a   Mita, M ^a   Maeda, Y ^a   Yamasaki, N Y ^a   Mitsuda, K ^a   Shirata, T ^b   Hayashi, T ^b   Takano, T ^c   Maeda, R ^c  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

^c National Institute of Adbanced Industrial Science and Technology (A1ST)

Author keywords

[No Author keywords available]

Indexed keywords

MEMS TECHNOLOGIES; MIRROR SURFACES; ULTRA LIGHT; X-RAY OPTICS; X-RAY REFLECTIVITIES;

MEMS; MICROELECTROMECHANICAL DEVICES; PHOTONICS; REFLECTION; X RAY DIFFRACTION;

COMPOSITE MICROMECHANICS;

EID: 54049094868     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/OMEMS.2008.4607850     Document Type: Conference Paper

References (4)

1. Y. Ezoe et al., "Micro pore X-ray optics using anisotropic wet etching of (110) silicon wafers", Appl. Opt., 45, pp. 8932-8938, 2006
2. M. Koshiishi et al., "Design and Fabrication of a MEMS X-ray Optic using Anisotropic Wet Etching of Si wafers, IEEE/LEOS Int. Conf. on Optical MEMS and Their Applications, pp. 84-85, 2006
3. M. Koshiishi et al., "The first light of a single-stage MEMS X-ray optic", Proc. of SPIE, 6688, 668814, 2007
4. Y. Ezoe et al., "A micromachined X-ray collector for space astronomy", Sens. & Act. A, in press.