Simulation of surface structural relaxation kinetics in silica glass accelerated by water vapor

Journal of Non-Crystalline Solids

Volumn 354, Issue 45-46, 2008, Pages 4981-4990

  Koike, A ^a   Tomozawa, M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

FTIR measurements; Glass transition; Optical spectroscopy; Silica; Structural relaxation; Surfaces and interfaces; Water

Indexed keywords

CONCENTRATION (PROCESS); FUSED SILICA; GLASS; HYDROSTATIC PRESSURE; LINEAR EQUATIONS; OFFSHORE OIL WELL PRODUCTION; OPTICAL FIBERS; OXIDES; RELAXATION PROCESSES; SILICA; STRUCTURAL RELAXATION; SURFACE DIFFUSION; SURFACE TREATMENT; VAPOR PRESSURE; VAPORS; WATER TREATMENT; WATER VAPOR;

FTIR MEASUREMENTS; GLASS TRANSITION; OPTICAL SPECTROSCOPY; SURFACES AND INTERFACES; WATER;

SURFACE RELAXATION;

EID: 53949096538     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.07.024     Document Type: Article

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