Refractive index, density and polarizability of silica glass with various fictive temperatures

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 6 A, 2004, Pages

  Kakiuchida, Hiroshi ^a   Saito, Kazuya ^a   Ikushima, Akira J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Density; Fictive temperature; Infrared absorption spectrum; Polarizability; Refractive index; Silica glass

Indexed keywords

ANNEALING; BONDING; DEFECTS; DENSITY (OPTICAL); DOPING (ADDITIVES); INFRARED SPECTROSCOPY; POLARIZATION; QUENCHING; REFRACTIVE INDEX; SEMICONDUCTING GERMANIUM; SILICON COMPOUNDS; ULTRAVIOLET RADIATION; VARIATIONAL TECHNIQUES; VISCOSITY;

FICTIVE TEMPERATURE; HIGH ENERGY RADIATIONS; INFRARED ABSORPTION SPECTRUM; KRAMERS-KROING RELATIONS;

FUSED SILICA;

EID: 3242815307     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l743     Document Type: Article

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