Surface and bulk structural relaxation kinetics of silica glass

Journal of Non-Crystalline Solids

Volumn 209, Issue 3, 1997, Pages 264-272

  Agarwal, Anand ^a,b   Tomozawa, Minoru ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Sterlite Communications Limited   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL BONDS; CRYSTAL STRUCTURE; HEAT TREATMENT; OPTICAL VARIABLES MEASUREMENT; PRESSURE EFFECTS; RELAXATION PROCESSES; THERMAL EFFECTS; VISCOUS FLOW;

HEAT TREATMENT TIME; INFRARED STRUCTURAL BAND POSITIONS; STRUCTURAL RELAXATION KINETICS; SURFACE RELAXATION KINETICS; WATER VAPOR PRESSURE;

FUSED SILICA;

EID: 0031078631     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(96)00570-4     Document Type: Article

References (10)

1. A. Agarwal, K.M. Davis and M. Tomozawa, J. Non-Cryst. Solids 185 (1995) 191.
2. A. Agarwal and M. Tomozawa, J. Am. Ceram. Soc. 78 (1995) 827.
3. K. Davis and M. Tomozawa, J. Non-Cryst. Solids 185 (1995) 203.
4. C.T. Moynihan, A.J. Easteal and M.A. Debolt, J. Am. Ceram. Soc. 59 (1976) 12.
5. H. Li, A. Agarwal and M. Tomozawa, J. Am. Ceram. Soc. 78 (1995) 1393.
6. F.G. Bianchini, L.C. Riu, G. Gagliardi, M. Gugliemi and C.G. Pantano, Glastech. Ber. 64 (1991) 205.
7. M. Tomozawa, H. Li and K.M. Davis, J. Non-Cryst. Solids 179 (1994) 162.
8. R.H. Doremus, in: Reactivity of Solids, ed. J.W. Mitchell, R.C. DeVries, R.W. Roberts and P. Cannon (Wiley, New York, 1969) p. 667.
9. G.J. Roberts and J.P. Robert, Phys. Chem. Glasses 5 (1964) 26.
10. G. Hetherington and K.H. Jack, Phys. Chem. Glasses 5 (1964) 130.