A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering

TMS Annual Meeting

Volumn 1, Issue , 2008, Pages 279-285

  Tavsanoglu, T ^a,b   Yucel, O ^a   Addemir, O ^a   Jeandin, M ^b  

^a ISTANBUL TECHNICAL UNIVERSITY   (Turkey)

^b PSL RESEARCH UNIVERSITY   (France)

Author keywords

BCN; Boron carbide; FGM; Plasma enhanced magnetron sputtering; SIMS

Indexed keywords

BORON; BORON CARBIDE; BORON NITRIDE; CARBON NITRIDE; FILMS; FUNCTIONALLY GRADED MATERIALS; MAGNETRON SPUTTERING; NITRIDES; THICK FILMS;

BCN; FGM; PLASMA ENHANCED MAGNETRON SPUTTERING; SIMS;

MATERIALS PROPERTIES;

EID: 53849113997     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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