Fabrication of CoPt magnetic nanodot arrays by electrodeposition process

Journal of Magnetism and Magnetic Materials

Volumn 320, Issue 22, 2008, Pages 3104-3107

  Ouchi, Takanari ^a   Arikawa, Yuki ^a   Homma, Takayuki ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

CoPt; Electrodeposition; Electron beam lithography; Nanoimprinting lithography; Patterned media

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; CLARIFICATION; ELECTRODEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; NANOPORES; NANOSTRUCTURED MATERIALS; REDUCTION; SPIN GLASS; SUBSTRATES;

AREA SELECTIVITY; AREAL RECORDING DENSITY; COPT; ELECTRO-CHEMICAL DEPOSITION; MECHANICAL POLISHING; NANO-DOT ARRAYS; NANOIMPRINTING LITHOGRAPHY; NANOPATTERNED SUBSTRATES; PATTERNED MEDIA; PATTERNED MEDIUM; SPIN-ON GLASS; UV NANO IMPRINT LITHOGRAPHY;

NANOIMPRINT LITHOGRAPHY;

EID: 53749100260     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2008.08.022     Document Type: Article

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