Electron-induced surface reactivity modification in Zinc oxide-based thin films

Applied Physics Letters

Volumn 93, Issue 14, 2008, Pages

  Sabayev, V ^a   Aronov, D ^a   Oster, L ^b   Rosenman, G ^a  

^a TEL AVIV UNIVERSITY   (Israel)

^b NEGEV ACADEMIC COLLEGE OF ENGINEERING   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CHEMICAL REACTIVITY; ELECTRON IRRADIATION; IRRADIATION; LIQUIDS; OXIDE FILMS; OXIDES; SEMICONDUCTING ZINC COMPOUNDS; SURFACE CHEMISTRY; SURFACE DEFECTS; THICK FILMS; THIN FILMS; THREE DIMENSIONAL; ZINC; ZINC OXIDE;

CHEMICAL ETCHING; CHEMICAL SURFACES; CONDUCTIVE PROPERTIES; DISPLAY TECHNOLOGIES; HIGH RESOLUTIONS; IRRADIATED SURFACES; KEY PARAMETERS; LOW-ENERGY ELECTRON IRRADIATION; OPTICAL-; PATTERNED ARRAYS; PHYSICAL INTERACTIONS; PHYSICAL PROCESSES; SURFACE INTERFACES; SURFACE MODIFICATIONS; SURFACE-REACTIVITY; ULTRA-THIN LAYERS;

SURFACE PROPERTIES;

EID: 53649103732     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2988322     Document Type: Article

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