In situ measurement of shrinkage during postreaction sintering of reaction-bonded silicon nitride

Journal of the American Ceramic Society

Volumn 91, Issue 10, 2008, Pages 3413-3415

  Wakihara, Toru ^a   Yabuki, Hiromasa ^a   Tatami, Junichi ^a   Komeya, Katsutoshi ^a   Meguro, Takeshi ^a   Hyuga, Hideki ^b   Kita, Hideki ^b  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDES; SILICON NITRIDE; SINTERING;

FABRICATION PROCESSES; IN-SITU MEASUREMENTS; REACTION-BONDED SILICON NITRIDE; REACTION-BONDING;

SILICON;

EID: 53349160662     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2008.02594.x     Document Type: Article

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