Sub- 50-nm track pitch mold using electron beam lithography for discrete track recording media

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 5, 2008, Pages 1666-1669

  Sbiaa, R ^a   Tan, E L ^a   Seoh, R M ^a,b   Aung, K O ^a   Wong, S K ^a   Piramanayagam, S N ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

^b Department of Electrical and Computer Engineering ^*  (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON GUNS; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETIC RECORDING; MICROSCOPIC EXAMINATION; MOLDS; PARTICLE BEAMS; PHOTORESISTS; REACTIVE ION ETCHING; SCANNING; SILICA; SILICON COMPOUNDS; THICKNESS MEASUREMENT;

APPLICATIONS.; BI LAYERS; DISCRETE TRACK RECORDING; EDGE ROUGHNESS; FEATURE SIZES; FINE PATTERNED; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPY; ION-MILLING; PATTERN TRANSFERRING; REACTIVE ION; SILICON OXIDES; TRACK PITCH;

ELECTRON BEAM LITHOGRAPHY;

EID: 53349127483     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2966426     Document Type: Article

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