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Vacuum

Volumn 83, Issue 3, 2008, Pages 585-588

Effect of heating on the residual stresses in TiN films investigated using synchrotron radiation

(4) Matsue, Tatsuya a Hanabusa, Takao b Kusaka, Kazuya b Sakata, Osami c

a NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY (Japan)

b UNIVERSITY OF TOKUSHIMA (Japan)

c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

Author keywords

Arc ion plating; Crystal structure; Residual stress; Surface morphology; Synchrotron radiation; TiN film

Indexed keywords

ANNEALING; BIAS VOLTAGE; CRYSTAL ORIENTATION; ELASTICITY; ELECTROMAGNETIC WAVES; HEATING; ION IMPLANTATION; METALLIC FILMS; MULTILAYER FILMS; PARTICLE ACCELERATORS; PLATING; POWDERS; RESIDUAL STRESSES; STRENGTH OF MATERIALS; SYNCHROTRON RADIATION; SYNCHROTRONS; TIN; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

ARC ION PLATING; AS-DEPOSITED; CRYSTAL STRUCTURE; FILM ORIENTATIONS; LATTICE STRAINS; MULTI LAYERING; PREFERRED ORIENTATION; RESIDUAL STRESS; STEEL SUBSTRATES; STRESS LEVELS; SURFACE MORPHOLOGY; TIN FILM; TIN FILMS;

MOLECULAR BEAM EPITAXY;

EID: 52949093893 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2008.04.068 Document Type: Article

Times cited : (11)

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