Dependence to processing conditions of structure in TiN films deposited by arc ion plating

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 647-651

  Matsue, Tatsuya ^a   Hanabusa, Takao ^b   Ikeuchi, Yasukazu ^a  

^a NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Crystal structure; Surface morphology; TiN film; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

COATINGS; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTRIC POTENTIAL; ION BEAMS; MOLECULAR STRUCTURE; NITROGEN; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ARC ION PLATING; BIAS VOLTAGE; THERMAL CORROSION BARRIERS; TIN FILMS;

TITANIUM NITRIDE;

EID: 2442476039     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.049     Document Type: Article

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