Study of solvent penetration inside a porous low k material by neutron reflectometry - Influence of material surface modifications and of solvent properties

Microelectronic Engineering

Volumn 85, Issue 10, 2008, Pages 2089-2093

  Rebiscoul D ^a   Broussous, L ^b   Puyrenier, W ^b   Rouessac, V ^c   Ayral, A ^c   Cubitt, R ^d  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

^c INSTITUT CHARLES GERHARDT   (France)

^d INSTITUT LAUE LANGEVIN   (France)

Author keywords

Neutron reflectometry; Plasma; Porosity; Porous dielectric material; Solvent diffusion

Indexed keywords

DEUTERIUM; ELECTRONICS INDUSTRY; INTEGRATED CIRCUITS; NEUTRON DIFFRACTION; NEUTRON REFLECTION; NEUTRONS; REFLECTION; REFLECTOMETERS;

DEUTERATED SOLVENTS; MATERIAL SURFACES; NEUTRON REFLECTOMETRY; PLASMA; POROSITY; POROUS DIELECTRIC MATERIAL; POROUS LOW-K MATERIALS; POST-TREATMENTS; SOLVENT DIFFUSION; SOLVENT PROPERTIES;

SOLVENTS;

EID: 52349085807     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.03.010     Document Type: Article

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