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Volumn , Issue , 2007, Pages 147-150

Tunable light grating integrated with high-voltage driver ic for image projection display

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMOBILE DRIVERS; CHARGE COUPLED DEVICES; CMOS INTEGRATED CIRCUITS; COMPOSITE MICROMECHANICS; DATA STORAGE EQUIPMENT; DISPLAY DEVICES; ELECTRON BEAM LITHOGRAPHY; ELECTROSTATIC ACCELERATORS; ELECTROSTATIC ACTUATORS; LIGHT; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; METALLIC COMPOUNDS; METALS; MICROELECTROMECHANICAL DEVICES; MONOLITHIC INTEGRATED CIRCUITS; MOS DEVICES; NETWORKS (CIRCUITS); NONMETALS; OPTICAL PROJECTORS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR MATERIALS; SILICON; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

EID: 52249090217     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (9)

References (7)
  • 3
    • 34547609999 scopus 로고    scopus 로고
    • M. W. Kowarz, J. G. Phalen, and C. J. Johnson, Line-Scanned Laser Display Architectures Based on GEMS Technology: From Three-Lens Three-Chip Systems to Low-Cost Optically Efficient Trilinear Systems, Society for Information Display 2006, San Francisco, California, USA, June 4-9, 2006, 67.2.
    • M. W. Kowarz, J. G. Phalen, and C. J. Johnson, "Line-Scanned Laser Display Architectures Based on GEMS Technology: From Three-Lens Three-Chip Systems to Low-Cost Optically Efficient Trilinear Systems," Society for Information Display 2006, San Francisco, California, USA, June 4-9, 2006, 67.2.
  • 5
    • 33747413703 scopus 로고    scopus 로고
    • High-Resolution Electrostatic Analog Tunable Grating With a Single-Mask Fabrication Process
    • W.-C. Shih, S.-G. Kim, and G. Barbastathis, "High-Resolution Electrostatic Analog Tunable Grating With a Single-Mask Fabrication Process," IEEE/ASME J. Microelectromech. Syst., vol. 15, no. 4, pp. 763-769, 2006.
    • (2006) IEEE/ASME J. Microelectromech. Syst , vol.15 , Issue.4 , pp. 763-769
    • Shih, W.-C.1    Kim, S.-G.2    Barbastathis, G.3
  • 6
    • 0029492057 scopus 로고
    • High Voltage BiCDMOS Technology on Bonded 2μm SOI Integrating Vertical npn pnp, 60V-LDMOS and MPU, Capable of 200°C Operation
    • Washington, USA, Dec. 10-13
    • H.Funaki, Y. Yamaguchi, Y. Kawaguchi, Y. Terazaki, H. Mochizuki, and A. Nakagawa, "High Voltage BiCDMOS Technology on Bonded 2μm SOI Integrating Vertical npn pnp, 60V-LDMOS and MPU, Capable of 200°C Operation," Proc. Int. Electron Devices Meeting (IEDM1995), Washington, USA, Dec. 10-13, 1995, pp.967-970.
    • (1995) Proc. Int. Electron Devices Meeting (IEDM1995) , pp. 967-970
    • Funaki, H.1    Yamaguchi, Y.2    Kawaguchi, Y.3    Terazaki, Y.4    Mochizuki, H.5    Nakagawa, A.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.