Nano-pattern replication using parylene thin film for optical applications

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2007, Pages 819-822

  Kan, T ^a   Matsumoto, K ^a   Shimoyama, I ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; HEAT RESISTANCE; LIGHT TRANSMISSION; MEMS; POLYMER FILMS; SEMICONDUCTING FILMS; SURFACE PLASMONS; THIN FILMS;

HEAT-RESISTANT POLYMERS; LINE-AND-SPACE; METAL EVAPORATION; OPTICAL APPLICATIONS; PARYLENE FILM; PATTERN TRANSFERS; TRANSMISSION ENHANCEMENT; VISIBLE RANGE;

OPTICAL FILMS;

EID: 52149113074     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.2007.4433001     Document Type: Conference Paper

References (4)

1. T. Thio, K. M. Pellerin, R. A. Linke, H. J. Lezec, and T. W. Ebbesen, "Enhanced light transmission through a single subwavelength aperture," Opt. Lett., vol. 26, pp. 1972-1974, 2001.
2. H. Schmid and B. Michel, "Siloxane polymers for high-resolution, high-accuracy soft lithography," Macromolecules, vol. 33, pp. 3042-3049, 2000.
3. Y-C Tung and K Kurabayashi, "Nanoimprinted strain-controlled elastomeric gratings for optical wavelength tuning," Appl. Phys. Lett., vol. 86, pp. 161113-, 2005.
4. N. Bowden, S. Brittain, A. G. Evans, J. W. Hutchinson, and G. M. Whitesides, "Spontaneous formation of ordered structures in thin films of metals supported on an elastomeric polymer," Nature, vol. 393, pp. 146-149, 1998.