Design and parallel fabrication of wire-grid polarization arrays for polarization-resolved imaging at 1.55 μm

Applied Optics

Volumn 47, Issue 20, 2008, Pages 3555-3560

  Zhou, Yaling ^a   Klotzkin, David J ^a  

^a University of Cincinnati   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT EXTINCTION; LITHOGRAPHY; SINGLE MODE FIBERS;

DESIGN CURVES; HOLOGRAPHIC LITHOGRAPHY; MICROMETER SIZES; MULTIPLE EXPOSURE; POLARIZATION EXTINCTION RATIO; PRACTICAL METHOD; SUB-WAVELENGTH; WIRE GRID POLARIZERS;

POLARIZATION;

ARTICLE; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; HOLOGRAPHY; INSTRUMENTATION; METHODOLOGY; PHOTOGRAPHY; REFRACTOMETRY; TRANSDUCER;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HOLOGRAPHY; MINIATURIZATION; PHOTOGRAPHY; REFRACTOMETRY; TRANSDUCERS;

EID: 51949095767     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.003555     Document Type: Article

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