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Volumn 516, Issue 23, 2008, Pages 8289-8294

Chemical and microstructural study in radio frequency sputtered CdTe oxide films prepared at different N2O pressures. Oxygen incorporation and film resputtering

Author keywords

68.55.Jk; 68.55.Nq; 79.20.Rf; 81.05.Gc; 81.15.Cd; Cadmium telluride; Sputtering; Structural properties; Surface morphology

Indexed keywords

CADMIUM ALLOYS; CADMIUM COMPOUNDS; ELECTROMAGNETIC WAVES;

EID: 51149092076     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.03.024     Document Type: Article
Times cited : (5)

References (27)
  • 23
    • 19044390957 scopus 로고
    • Partial pressure analyzers and analysis
    • Whetten N.R., and Long Jr. R. (Eds), American Vacuum Society, New York
    • Drinkwine M.J., and Lichtman D. Partial pressure analyzers and analysis. In: Whetten N.R., and Long Jr. R. (Eds). American Vacuum Society Monograph Series (1978), American Vacuum Society, New York
    • (1978) American Vacuum Society Monograph Series
    • Drinkwine, M.J.1    Lichtman, D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.