Fabrication of photo-patternable inorganic-organic hybrid film by spin-coating

Thin Solid Films

Volumn 466, Issue 1-2, 2004, Pages 204-208

  Jeong, Sunho ^a   Jang, Woo Hyuk ^b   Moon, Jooho ^a  

^a Yonsei University   (South Korea)

^b Olantech Co Ltd   (South Korea)

Author keywords

Organically modified silicate; Pattern; Refractive index; Sol gel; Spin coating

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; MICROSTRUCTURE; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SOL-GELS; SPIN COATING; THERMAL EFFECTS; THICKNESS MEASUREMENT;

HYBRID FILMS; ORGANICALLY MODIFIED SILICATES; PATTERN; PHOTO ACTIVE MOLECULES;

THICK FILMS;

EID: 4544344731     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.118     Document Type: Article

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