157 nm and 193 nm scatter, R and T measurement technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 137-145

  Gliech, Stefan ^a   Gessner, Henning ^a   Hultåker, Annette ^a   Duparré, Angela ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

157 nm; 193 nm; Angle resolved scattering; Light scattering; Optical components; Reflectance; Total scattering; Transmittance; VUV

Indexed keywords

EXCIMER LASERS; GONIOMETERS; LIGHT REFLECTION; LIGHT SCATTERING; LIGHT TRANSMISSION; PHOTOMULTIPLIERS; ULTRAVIOLET RADIATION;

157 NM; 193 NM; ANGLE RESOLVED SCATTERING; OPTICAL COMPONENTS; TOTAL SCATTERING; VUV;

ANTIREFLECTION COATINGS;

EID: 1942470558     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.513321     Document Type: Conference Paper

References (6)

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2. J. Ferré-Borrull, A. Duparré, and E. Quesnel, "Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm", Appl. Opt. 39, 5854-5864, 2000.
3. J. Ferré-Borrull, A. Duparré, and E. Quesnel, "Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings", Appl. Opt. 40, 2190-2199, 2001.
4. P. Kadkhoda, A. Müller, D. Ristau, A. Duparré, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindström, C-G. Ribbing, and J.M. Bennett, "International round-robin experiment to test the International Organization for Standardization total-scattering draft standard", Appl. Opt. 39, 3321-3332, 2000.
5. S. Gliech, J. Steinert, and A. Duparré, "Light scattering measurements of optical thin-film components at 157 and 193 nm", Appl. Opt., 41, 3224-3235, 2002.
6. 2 for VUV optical components: roughness, surface scatter, and bulk scatter", Proc SPIE LBOC 7 / Boulder Damage Symposium, 2002, vol. 4932, 444-451, (SPIE) 2003.