Calcium fluoride for ArF laser lithography - Characterization by in situ transmission and LIF measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4932, Issue , 2003, Pages 458-466

  Muhlig Ch ^a   Triebel, W ^a   Topfer G ^a   Jordanov, A ^b  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b Schott Lithotec AG   (Germany)

Author keywords

193 nm; CaF2; Color centers; Laser induced fluorescence; Optical properties; UV optical material

Indexed keywords

FLUORESCENCE; LASER DAMAGE; LASER PULSES; LITHOGRAPHY;

FLUENCE DEPENDENT TRANSMISSION (FDT);

FLUORSPAR;

EID: 0042361876     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473181     Document Type: Conference Paper

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