Prediction of plasma etching using a randomized generalized regression neural network

Vacuum

Volumn 76, Issue 1, 2004, Pages 37-43

  Kim, Byungwhan ^a   Lee, Duk Woo ^a   Park, Kyung Young ^a   Choi, Serk Rim ^a   Choi, Seongjin ^b  

^a Sejong University   (South Korea)

^b Korea University   (South Korea)

Author keywords

Generalized regression neural network; Plasma etching; Random generator; Statistical regression model

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; NEURAL NETWORKS; NEUTRONS; RANDOM NUMBER GENERATION; REGRESSION ANALYSIS; SILICA; THIN FILMS;

GENERALIZED REGRESSION NEURAL NETWORK; RANDOM GENERATORS (RG); STATISTICAL REGRESSION MODEL;

PLASMA ETCHING;

EID: 5044248430     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.05.018     Document Type: Article

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