Structural characterization of nanocomposite Ti-Si-N coatings prepared by pulsed dc plasma-enhanced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1694-1698

  Ma, Shengli ^a,b   Ma, Dayan ^a   Xu, Kewei ^a   Jie, Wanqi ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COATINGS; HIGH TEMPERATURE EFFECTS; MICROHARDNESS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OXIDATION RESISTANCE; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL STABILITY; MULTICOMPONENT COATINGS; NANOCOMPOSITE COATINGS; STRUCTURAL CHARACTERIZATION;

TITANIUM COMPOUNDS;

EID: 5044242553     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1763593     Document Type: Article

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