Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Cech, Vladimir ^a   Studynka, Jan ^a   Janos, Filip ^a   Perina, Vratislav ^b  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

FT IR; Mass spectroscopy; Organosilicon precursors; Plasma polymerization; Rutherford backscattering spectrometry (RBS)

Indexed keywords

CHEMICAL STRUCTURE; DEPOSITED FILMS; DEPOSITION PARAMETERS; DEPOSITION PROCESS; ELASTIC RECOIL DETECTION ANALYSIS; ELEMENTAL COMPOSITIONS; FLOWRATE RATIO; FT-IR; HYDROGENATED AMORPHOUS SILICON CARBIDE; INFLUENCE OF OXYGEN; MASS SPECTROSCOPY; ORGANOSILICON PRECURSORS; OXYGEN GAS; PLASMA POLYMER FILMS; PLASMA POLYMERS; PLASMA SPECIES; PULSED PLASMA; RUTHERFORD BACK-SCATTERING SPECTROMETRY; RUTHERFORD BACKSCATTERING SPECTROMETRY (RBS); SILICON DIOXIDE; TETRAVINYLSILANE; VINYL GROUP;

AMORPHOUS FILMS; AMORPHOUS SILICON; BACKSCATTERING; INFRARED SPECTROSCOPY; MASS SPECTROMETERS; MASS SPECTROMETRY; OXYGEN; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; STRUCTURE (COMPOSITION);

POLYMER FILMS;

EID: 50349094803     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731903     Document Type: Conference Paper

References (9)

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