Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 181-187

  Cech, V ^a   Inagaki, N ^b   Vanek, J ^a   Prikryl, R ^a   Grycova, A ^a   Zemek, J ^c  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^b SHIZUOKA UNIVERSITY   (Japan)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Chemical vapor deposition (CVD); Coatings; Organosilicon; Plasma processing and deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GLASS FIBERS; OPTICAL COATINGS; PLASMA APPLICATIONS; POLYCONDENSATION; POLYMERIZATION;

ORGANOSILICON; PLASMA PROCESSING AND DEPOSITION; POLYCONDENSED FILMS; VINYLTRIETHOXYSILANE;

THIN FILMS;

EID: 33344461433     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.271     Document Type: Conference Paper

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