Development of equipment-installed APC system and critical dimension control technology of gate-hard-mask etching using its system

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Volumn , Issue , 2005, Pages 139-142

  Imai, Shin Ichi ^a   Sano, Asaki ^a   Fujimoto, Manabu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; ETCHING; PERFORMANCE; PROBLEM SOLVING;

CONNECTION-COSTS; GATE-HARD-MASK ETCHING; PROCESS CAPABILITY;

PROCESS CONTROL;

EID: 28744446482     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/issm.2005.1513318     Document Type: Conference Paper

References (4)

1. C. Petronis and R. Patrick, "Targeting gate CD using feedforward APC and voltage control," Solid State Technology, pp 59, December 2003.
2. J. Moyne, "Making the move to fab-wide APC," Solid State Technology, pp 47, September 2004.
3. M. Dorough, C. Jensen, D. Do, M. Hansen, and E. Standley, "Tactical Advanced Process Control," in Proceedings of the International Symposium on Semiconductor Manufacturing, 2003, pp 358.
4. M. Tajima, H. Arimoto, T. K. Goto, and F. Harada, "Advanced Process control for 40nm gate fabrication," Proceedings of the International Symposium on Semiconductor Manufacturing., 2003, pp 115.