Supercritical carbon dioxide compatible salts: Synthesis and application to next generation lithography

Journal of Photopolymer Science and Technology

Volumn 21, Issue 3, 2008, Pages 393-396

  Tanaka, Manabu ^a   Rastogi, Abhinav ^a,b   Felix, Nelson M ^a   Ober, Christopher K ^a  

^a School of Operations Research and Industrial Engineering   (United States)

^b NONE   (United States)

Author keywords

Extreme ultraviolet; Photoresist; Quaternary ammonium salt; Supercritical carbon dioxide

Indexed keywords

EID: 50149119247     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.393     Document Type: Article

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