A new paradigm for high resolution 3D lithography

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2008, Pages 395-398

  Mosher, L A ^a   Waits, C M ^a,b   Morgan, B ^b   Ghodssi, R ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; LITHOGRAPHY; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; REACTIVE ION ETCHING; THREE DIMENSIONAL;

3D LITHOGRAPHY; 3D MICROMACHINING; AND MODELING; GRAY SCALING; GRAY-SCALE LITHOGRAPHY; HIGH RESOLUTIONS; INTERNATIONAL CONFERENCES; MICRO-ELECTRO MECHANICAL SYSTEMS; VERTICAL RESOLUTIONS;

LAWS AND LEGISLATION;

EID: 50149109652     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2008.4443676     Document Type: Conference Paper

References (6)

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2. Gal, US Patent 5,310,623, 1994.
3. B. Wagner, H.J. Quenzer, W. Henke, W. Hoppe, W. Pilz, "Microfabrication of complex surface topographies using grey-tone lithography," Sens. and Actuators A, vol. 46-47, pp. 89-94, 1995.
4. C. Waits, B. Morgan, M. Kastantin, R. Ghodssi, "Microfabrication of 3D silicon MEMS structures using gray-scale lithography and deep reactive ion etching", Sensors and Actuators A (Physical), vol. 119, pp. 245-25, 2005.
5. A. Epstein, "Millimeter-scale, micro-electro mechanical systems gas turbine engines", J. of Eng. for Gas Turbines and Power, vol. 126, pp. 205-226, 2004
6. B. Morgan, C. Waits, J. Krizmanic and R. Ghodssi, "Development of a Deep Silicon Phase Fresnel lens using Gray-scale Technology and Deep Reactive Ion Etching," J. of Microelectromech. Sys. (JMEMS), vol. 13, pp. 113-120, 2004.