A highly symmetric two-handed metamaterial spontaneously matching the wave impedance

Optics Express

Volumn 16, Issue 17, 2008, Pages 12764-12770

  Chiang, Yi Ju ^a   Yen, Ta Jen ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETS; METAMATERIALS;

AUTOMATICALLY MATCH; DUAL-BAND BANDPASS FILTER; ELECTROMAGNETIC DEVICES; ELECTROMAGNETIC RESPONSE; EXTERNAL EXCITATION; NORMAL INCIDENCE; THREE-LAYERED STRUCTURES; WAVE IMPEDANCES;

BANDPASS FILTERS;

METAL;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; IMPEDANCE; INSTRUMENTATION; LIGHT; MATERIALS; MATERIALS TESTING; OPTICS; RADIATION SCATTERING;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; ELECTRIC IMPEDANCE; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHT; MANUFACTURED MATERIALS; MATERIALS TESTING; METALS; MODELS, CHEMICAL; OPTICS; SCATTERING, RADIATION;

EID: 50049115808     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.012764     Document Type: Article

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