Improved hydrophobicity of vapor coated chlorosilane self assembled monolayers using evaporative drying of solvent and annealing

TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2007, Pages 1629-1632

  Khoo, H S ^a   Huang, T W ^a   Chen, Y F ^a   Chen, M H ^b   Hsu, T H ^a   Tseng, F G ^a,b,c  

^a ACADEMIA SINICA   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

Author keywords

Annealing; Evaporative drying; Hydrophobicity; PDMS nanopillars; Self assembled monolayer

Indexed keywords

ACOUSTIC MICROSCOPES; ACTUATORS; AMPLITUDE MODULATION; ANNEALING; CONTACT ANGLE; CURING; DEWATERING; DRYING; ELECTRON ENERGY LEVELS; HYDROPHOBICITY; MICROSYSTEMS; MISSILE BASES; MONOLAYERS; SENSORS; SOLVENTS; TRANSDUCERS; ULTRATHIN FILMS; VAPORS;

ANNEALING PROCESSING; ATOMIC FORCE MICROSCOPE; CHLOROSILANE; CONTACT ANGLES; EVAPORATIVE DRYING; GLASS SUBSTRATES; INTERNATIONAL CONFERENCES; MOLECULAR CHAINS; MULTI LAYERING; NANO PILLARS; NOVEL METHODS; PDMS NANOPILLARS; POLYDIMETHYLSILOXANE PDMS; SELF-ASSEMBLED MONOLAYER; SOLID-STATE SENSORS; SUPER-HYDROPHOBICITY;

SELF ASSEMBLED MONOLAYERS;

EID: 50049102373     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2007.4300461     Document Type: Conference Paper

References (9)

1. R. N. Wenzel, "Surface roughness and contact angle," Journal of Physical Colloid Chemistry, 53, 9, pp. 1466-1467, 1949.
2. A. B. D. Cassie and S. Baxter, "Wettability of porous surfaces," Transactions of the Faraday Society, 40, pp. 546-551, 1944.
3. S. Herminghaus, "Roughness-induced non-wetting," Europhysics Letters, 52, pp. 165-170, 2000.
4. E. Ostuni, L. Yan, and G. M. Whitesides, "The interaction of proteins and cells with self-assembled monolayers of alkanethiolates on gold and silver," Colloids and Surfaces B: Biointerfaces, vol. 15, pp. 3-30, 1999.
5. W. R. Ashurst, C. Carraro, and R. Maboudian, "Vapor phase anti-stiction coatings for MEMS," IEEE Transactions on Device and Materials Reliability, vol. 3, no. 4, pp. 173-178, December 2003.
6. A. Kumar, H. A. Biebuyck, and G. M. Whitesides, "The use of self-assembled monolayers and a selective etch to generate patterned gold features," J. Am. Chem. Soc., 114, pp. 9188-9189, 1992.
7. G.-Y. Jung, Z. Li, W. Wu, Y. Chen, D. L. Olynick, S.-Y. Wang, W.M. Tong, and R. S. Williams, "Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography," Langmuir, 21, pp.1158-1161, 2005.
8. A. Y. Fadeev and T. J. McCarthy, "Self-assembly is not the only reaction possible between alkyltrichlorosilanes and surfaces: monomolecular and oligomeric covalently attached layers of dichloro- and trichloroalkylsilanes on silicon," Langmuir, 16, pp. 7268-7274, 2000.
9. V.-M. Graubner, R. Jordan, O. Nuyken, B. Schnyder, T. Lippert, R. Kötz, and A. Wokaun, "Photochemical modification of cross-linked poly(dimethylsiloxane) by irradiation at 172 nm," Macromolecules, 37, pp.5936-5943, 2004.