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Volumn 41, Issue 15, 2008, Pages
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Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target
a,b
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION;
ALUMINUM;
ALUMINUM CLADDING;
ANGULAR DISTRIBUTION;
ATOMIC PHYSICS;
ATOMIC SPECTROSCOPY;
ATOMS;
DISTRIBUTION FUNCTIONS;
ETCHING;
INDUCTIVELY COUPLED PLASMA;
LASERS;
LIGHT METALS;
PHOTORESISTS;
PLASMA ETCHING;
PLASMAS;
SPUTTER DEPOSITION;
TARGETS;
VELOCITY CONTROL;
AR PLASMAS;
BOMBARDMENT ENERGY;
DOPPLER;
EXTERNAL-CAVITY DIODE LASER;
HIGH-DENSITY;
INDUCTIVELY COUPLED PLASMA ETCHING;
LASER INDUCED FLUORESCENCE LIF);
LOW PRESSURE;
RADIO FREQUENCIES;
VELOCITY DISTRIBUTION FUNCTION;
ABSORPTION SPECTROSCOPY;
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EID: 49749145260
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/41/15/152003 Document Type: Article |
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Times cited : (15)
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References (14)
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