The influence of an auxiliary discharge on the ablation plasma produced by a pulsed electron beam

Journal of Optoelectronics and Advanced Materials

Volumn 10, Issue 8, 2008, Pages 2020-2023

  Nistor, M ^a   Gherendi, F ^a   Mandache, N B ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Ablation plasma; Auxiliary discharge; Ion probes; Pulsed electron deposition

Indexed keywords

ABLATION; ELECTRON BEAMS; ELECTRON SOURCES; II-VI SEMICONDUCTORS; IONS; PROBES; ZINC OXIDE;

ABLATION PLASMA; CHANNEL SPARK DISCHARGES; DISCHARGE CURRENTS; ION PROBE; PLASMA PLUMES; PULSED ELECTRON BEAMS; PULSED ELECTRON DEPOSITION; TIME OF FLIGHT METHODS;

ELECTRIC DISCHARGES;

EID: 49149083954     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (5)

1. G Müller, M. Konijnenberg, G. Krafft, C. Schultheiss, Science and Technology of Thin Film, World Scientific Publ. Co. PET. LTD, 89 (1995).
2. M. Nistor, F. Gherendi, M. Magureanu, N. B. Mandache, J. Optoelectron. Adv. Mater. 7, 979 (2005).
3. G. Dinescu, C. Ruset, M. Dinescu, Plasma Process. Polym., 4, 282 (2007).
4. P. Mukherjee, S. Chen, J.B. Cuff, P Sakthivel, S. Witanachchi, J. Appl. Phys. 91, 1828 (2005).
5. M. Nistor, N.B. Mandache, J. Optoelectron. Adv. Mater. 7, 1619 (2005).