Preparation and characterization of epitaxial Fe2-x Tix O3 films with various Ti concentrations (0.5 (5) Takada, Y a Nakanishi, M a Fujii, T a Takada, J a Muraoka, Y a a OKAYAMA UNIVERSITY (Japan)

Journal of Applied Physics

Volumn 104, Issue 3, 2008, Pages

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CONCENTRATION (PROCESS); ELECTROMAGNETISM; EPITAXIAL FILMS; FERROMAGNETISM; HELICONS; IRON; IRON ORES; MAGNETIC SEMICONDUCTORS; MAGNETISM; MOLECULAR BEAM EPITAXY; NONMETALS; OXIDE MINERALS; OXYGEN; OZONE WATER TREATMENT; REACTIVE SPUTTERING; SEMICONDUCTING FILMS; SOLID SOLUTIONS;

C -AXIS; HELICON PLASMAS; HIGH CURIE TEMPERATURES; ILMENITE-HEMATITE; INVERSE TEMPERATURES; LOW TEMPERATURE; ORDERED STRUCTURES; OXYGEN PRESSURES; ROOM TEMPERATURES; SEMICONDUCTING BEHAVIOR; SINGLE PHASING; STRUCTURAL CHARACTERIZATIONS; WELL-CRYSTALLIZED;

FILM PREPARATION;

EID: 49749096094     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2966298     Document Type: Article

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