Soft lithography molding of polymer integrated optical devices: Reduction of the background residue

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1764-1769

  Paloczi, George T ^a   Huang, Yanyi ^a   Scheuer, Jacob ^a   Yariv, Amnon ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICRORING RESONATORS; MODAL PROPERTIES; SOFT MOLD REPLICATION; WET ETCHING;

ELECTRON BEAMS; ETCHING; LIGHT MODULATORS; MOLDING; OPTICAL DEVICES; OPTICAL FILTERS; OPTICAL MICROSCOPY; PLASTIC FILMS; SUBSTRATES; WAVEGUIDES;

LITHOGRAPHY;

EID: 4944267475     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1767827     Document Type: Article

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