Top-down topography of deeply etched silicon in the scanning electron microscope

Review of Scientific Instruments

Volumn 75, Issue 8, 2004, Pages 2524-2528

  Wells, Oliver C ^a   Murray, Conal E ^a   Rullan, Jonathan L ^a,b   Gignac, Lynne M ^a  

^a IBM RESEARCH   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERED ELECTRONS (BSE); FOCUSED ION BEAMS (FIB); IMAGE-FORMING DETECTOR SYSTEMS; LOW-LOSS ELECTRONS (LLE);

BACKSCATTERING; DETECTORS; DIFFRACTION; ELECTRON BEAMS; ELECTRONIC STRUCTURE; ETCHING; IMAGING TECHNIQUES; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY;

SILICON WAFERS;

EID: 4944256709     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1771491     Document Type: Article

References (11)

1. See, for example, Proceedings of the SPIE Conference on Metrology, Inspection, and Process Control for Microlithography XII, SPIE 3677 (1999).
2. R. Richter and K. Kirtley, Proc. SPIE 1823, 233 (1992).
3. M. Hatzakis, Appl. Phys. Lett. 18, 7 (1971).
4. J. Orloff, M. Utlaut, and L. Swanson, High Resolution Focused Ion Beams (Kluwer Academic/Plenum, New York, 2003).
5. M. P. Davidson and A. E. Vladar, Proceedings of the SPIE Conference on Metrology, Inspection, and Process Control for Microlithography XII, SPIE 3677, 640 (1999).
6. E. DiFabrizio, L. Luciani, L. Grella, M. Baciocchi, L. Mastrogiacomo, and M. Gentili, J. Vac. Sci. Technol. B 10, 1187 (1992).
7. The use of beam-rocking techniques to obtain images of the inner surfaces of cavities such as those shown in Fig. 1 has been described previously in O. C. Wells, Rev. Sci. Instrum. 67, 1458 (1996).
8. L. Reimer, Transmission Electron Microscopy. Physics of Image Formation and Microanalysis, Springer Series in Optical Sciences (Springer, Berlin, 1984), pp. 63-67.
9. The spatial distribution of BSE were collected using a Nordif CX30 detector and CHANNELS acquisition software from HKL Technology, Inc. (Danbury, CT).
10. M. Horacek, Rev. Sci. Instrum. 74, 3379 (2003).
11. O. C. Wells, in Proceedings of Microscopy and Microanalysis, edited by E. Voekl et al. (Cambridge University Press, Cambridge, UK, 2002), Suppl. 2, pp. 106-107.