X-ray diffraction study of polycrystalline BiFe O3 thin films under electric field

Applied Physics Letters

Volumn 93, Issue 4, 2008, Pages

  Nakashima, Seiji ^a   Sakata, Osami ^b,c   Nakamura, Yoshitaka ^a   Kanashima, Takeshi ^a   Funakubo, Hiroshi ^d   Okuyama, Masanori ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRIC FIELDS; ELECTROMAGNETIC FIELD THEORY; ELECTROMAGNETIC FIELDS; EPITAXIAL GROWTH; OZONE WATER TREATMENT; PIEZOELECTRICITY; PLATINUM; SILICON; THICK FILMS; THIN FILMS;

DIFFRACTION MEASUREMENTS; DIFFRACTION PEAKS; PEAK SHIFTING; PIEZOELECTRIC CONSTANTS; PIEZOELECTRIC RESPONSES; POLY-CRYSTALLINE; RECTANGULAR PULSES; SI SUBSTRATE; X-RAY DIFFRACTION STUDIES;

DIFFRACTION;

EID: 49149118796     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2967736     Document Type: Article

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