The influence of solvent residue, support type and UV-irradiation on surface morphology of poly(methyl methacrylate) films studied by Atomic Force Microscopy

Polymer Testing

Volumn 27, Issue 6, 2008, Pages 736-742

  Kaczmarek, Halina ^a   Chaberska, Hanna ^a  

^a NICOLAUS COPERNICUS UNIVERSITY   (Poland)

Author keywords

Aluminum; Atomic Force Microscopy (AFM); Glass; Poly(methyl methacrylate) (PMMA); Surface properties; UV irradiation

Indexed keywords

ACETONE; ALUMINA; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; ELECTRON BEAM LITHOGRAPHY; ESTERS; IMAGING TECHNIQUES; IRRADIATION; LIGHT METALS; MICROSCOPIC EXAMINATION; ORGANIC COMPOUNDS; ORGANIC SOLVENTS; POLYMER FILMS; POLYMER SOLUTIONS; POLYMERS; SCANNING PROBE MICROSCOPY; SOLVENTS; TOLUENE;

ALUMINUM; ATOMIC FORCE MICROSCOPY (AFM); BEFORE AND AFTER; GLASS; PMMA FILMS; POLY(METHYL METHACRYLATE) (PMMA); POLYMETHYL METHACRYLATE FILMS; SAMPLE MORPHOLOGY; SURFACE PROPERTIES; TETRA-HYDROFURAN; UV IRRADIATIONS; UV-IRRADIATION;

BOROSILICATE GLASS;

ACETONE; ALUMINUM; ANATOMY; CHLOROFORM; ESTERS; GLASS; LITHOGRAPHY; MICROSCOPY; POLYMERS; POLYMETHYL METHACRYLATE; RADIATION EFFECTS; RESIDUES; SOLVENTS; TOLUENE; TOPOGRAPHY; ULTRAVIOLET RADIATION;

EID: 49149087499     PISSN: 01429418     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymertesting.2008.05.005     Document Type: Article

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