Manufacturable wafer-scale microstrip patch antennas

IEEE Antennas and Propagation Society, AP-S International Symposium (Digest)

Volumn , Issue , 2007, Pages 928-931

  Margomenos, A ^a   Jain, A ^a   Munn, J ^a   Kuo, A ^a   Sabet, K ^a   Katehi, L P B ^b  

^a EMAG Technologies Inc   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 48349122622     PISSN: 15223965     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/APS.2007.4395647     Document Type: Conference Paper

References (6)

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2. M.J. Vaughan, et al, "Improvement of microstrip patch antenna radiation patterns", IEEE Trans. on Antennas and Propagation, vol. 42, no.6, pp. 882-885, June 1994.
3. N. Miki, C.J. Teo, L.C. Ho, and X.Zhang, "Enhancement of rotordynamic performance of high-speed micro-rotors for power MEMS applications by precision deep reactive ion etching", Sensors and Actuators A vol. 104, pp. 263-267, 2003.
4. Ayon A et al, "Characterization of a time multiplexed inductively coupled plasma etcher", J. Electrochem. Soc., vol.146, pp. 339-349, January 1999.
5. T. F. Hill, "Analysis of DRIE Uniformity for MEMS", MS Thesis, MIT, 2004
6. S. Jensen et al, "Uniformity-improving dummy structures for deep reactive ion etching (DRIE) processes", Proc. SPIE, vol. 5715, pp. 39-46, 2005.