Theoretical and experimental analyses of atom diffusion characteristics on wire bonding interfaces

Journal of Physics D: Applied Physics

Volumn 41, Issue 13, 2008, Pages

  Li, Junhui ^a,b,c   Fuliang, Wang ^a,b   Han, Lei ^a,b   Zhong, Jue ^a,b  

^a CENTRAL SOUTH UNIVERSITY   (China)

^b BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^c State Key Laboratory of Digital Manufacturing Equipment and Technology   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC COMPOUNDS; ATOMIC PHYSICS; ATOMS; DIFFUSION IN SOLIDS; DISLOCATIONS (CRYSTALS); FINITE ELEMENT METHOD; METAL CLADDING; METALLIC COMPOUNDS; METALS; SEMICONDUCTOR DOPING; TRANSMISSION ELECTRON MICROSCOPY; ULTRASONICS;

ATOM DIFFUSION; BONDING INTERFACES; BONDING STRENGTHS; CRYSTALLINE LATTICES; DIFFUSION CHANNELS; DISLOCATION DENSITIES; DRIVING FORCES; FINITE ELEMENTS SIMULATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPE (HRTEM); HIGH STRESS; INTER-DIFFUSION; SHORT CIRCUIT DIFFUSION; ULTRASONIC BONDING; ULTRASONIC VIBRATIONS; WIRE BONDING (WB);

DIFFUSION;

EID: 48249146183     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/13/135303     Document Type: Article

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