The excitation of one-dimensional plasmons in Si and Au-Si complex atom wires

Nanotechnology

Volumn 19, Issue 35, 2008, Pages

  Liu, Canhua ^a   Inaoka, Takeshi ^b   Yaginuma, Shin ^a   Nakayama, Tomonobu ^a   Aono, Masakazu ^a   Nagao, Tadaaki ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; ELECTRIC NETWORK ANALYSIS; ENERGY DISSIPATION; METALLIZING; PLASMONS; QUANTUM ELECTRONICS; SEMICONDUCTOR QUANTUM WIRES; SILICON; WIRE;

ANISOTROPIC DISPERSION; CONDUCTIVE CHANNELS; ELECTRON ENERGY LOSS SPECTROSCOPY (EELS).; LOW ENERGIES; METALLICITY; NONLOCAL RESPONSES; ONE-DIMENSIONAL; QUANTUM WIRES; QUANTUM-MECHANICAL (QM); SI (111);

ELECTRON ENERGY LOSS SPECTROSCOPY;

GOLD COMPLEX; SILICON;

ADSORPTION; ANISOTROPY; ARTICLE; ELECTRON ENERGY LOSS SPECTROSCOPY; PRIORITY JOURNAL; QUANTUM MECHANICS; SEMICONDUCTOR;

EID: 48249097535     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/35/355204     Document Type: Article

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