Dispersion and damping of a two-dimensional plasmon in a metallic surface-state band

Physical Review Letters

Volumn 86, Issue 25, 2001, Pages 5747-5750

  Nagao, Tadaaki ^a,b   Hildebrandt, Torsten ^c   Henzler, Martin ^c   Hasegawa, Shuji ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c Leibniz Universitämlt Hannover Fakultämlt fümlr Mathematik und Physik Institut fümlr Differentialgeometrie Welfengarten 1   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; DISPERSIONS; ELECTRON TRANSITIONS; ELECTRONIC STRUCTURE; FERMI LEVEL; HIGH RESOLUTION ELECTRON MICROSCOPY; LOW ENERGY ELECTRON DIFFRACTION; PHASE INTERFACES; PLASMA DENSITY; SILICON; SILICON WAFERS; THIN FILMS;

METALLIC SURFACE-STATE BANDS;

PLASMA THEORY;

EID: 0035908003     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.5747     Document Type: Article

References (21)