Capillary filling of sub- 10 nm nanochannels

Journal of Applied Physics

Volumn 104, Issue 1, 2008, Pages

  Haneveld, Jeroen ^a   Tas, Niels R ^a   Brunets, Nataliya ^a   Jansen, Henri V ^a   Elwenspoek, Miko ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL DESIGN; SILICA; SILICON COMPOUNDS;

AMERICAN INSTITUTE OF PHYSICS (AIP); CAPILLARY FILLING; CHANNEL HEIGHT; CONSTANT RATES; DEIONIZED WATER (DIW); FILLING KINETICS; NANO-CHANNELS; SILICON OXIDES; SILICON-BASED; SPACER LAYERS;

NONMETALS;

EID: 47749126553     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2952053     Document Type: Article

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