Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Volumn , Issue , 2007, Pages 340-341

  Furuta, Y ^a   Uchiya, N ^a   Nishikawa, H ^a   Haga, J ^b   Oikawa, M ^b   Satoh, T ^b   Ishii, Y ^b   Kamiya, T ^b   Nakao, R ^c   Uchida, S ^c  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC DEVICES; ELECTRODES; ESCHERICHIA COLI; ION BEAM LITHOGRAPHY; METALLIZING; NANOTECHNOLOGY; NONMETALS; OPTICAL DESIGN; PARTICLE BEAMS; PHOTORESISTS; PLANTS (BOTANY); SILICON;

AC BIAS; HIGH ASPECT RATIO (HAR); INTERNATIONAL (CO); MICRO-PROCESSES; OPTICAL MICROSCOPE (OM); PROTON BEAM WRITING; SCANNING ELECTRON MICROSCOPY (SEM) IMAGES; SURFACE ELECTRODES;

ASPECT RATIO;

EID: 47349099344     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2007.4456243     Document Type: Conference Paper

References (4)

1. F. Watt et al. International Journal of Nanoscience, Vol. 4, No. 3 (2005) 269-286.
2. T. Enjoji et al. J. Inst. Electrostat. Jpn, 31, 1, (2007) 8-13.
3. N. Uchiya et al. Nucl. Instr. and Meth. in Phys. Res. B, 260 (2007) 405-408.
4. T. Kamiya et al. Nucl. Instr. and Meth. in Phys. Res. B, 104 (1995) 43.